The Nano-Femto Lab Group

Our motto:

work hard, play hard

"In parvitate immensitas"

Courtesy of Jill Miwa (...drawn during a training session...)

"3D-AFM topography in tapping mode, of as-deposited barium titanate mesostructures (~300nm lateral size and ~55 nm in height) on platinum coated silicon (100) substrates. The "INRS-NFL" logo was realized by a combination of nanostenciling and pulsed laser deposition at room-temperature.
Nanostenciling emerged as a versatile alternative approach for surface nanostructuring and patterning. Structures with various shapes and sizes can be positioned very accurately by physical vapor depositions through miniature masks (nanostencil). Predefined architectures are realized in free-standing membranes and directly replicated on a substrate of choice.
The process can be performed in high and ultrahigh vacuum and employed for a wide range of materials combination (metals, semiconductors, complex oxides, organic material). Our group logo presented in the image above, covers a total area of 20 x 17 microns, and basically can be "printed" several times on the circumference of a human hair (~80microns in diam)." C.V.Cojocaru, C. Harnagea, A. Pignolet and F. Rosei